海外高科技人才回流对中国区域经济发展的影响机制研究——基于门槛效应的实证分析

Research on the influence mechanism of overseas high-tech talents reflux on China"s regional economic development:an empirical analysis based on the threshold effect

摘要:

本文利用中国2002-2016年省际面板数据,以国际人才迁移和中国海归回流为研究背景,以R D投入强度作为人力资源对中国区域经济增长的门槛变量,构建了门限回归模型,实证研究海外高科技人才回流对中国区域经济增长的影响。研究结果表明：R D投入的双重门限效应显著作用于海外高科技人才对区域经济发展的贡献,随着R D投入强度的不同,海外高科技人才回流对区域经济增长的影响存在U型关系,具体而言,当R D投入强度小于0.010或大于0.058时,其正向影响最为显著,介于该值之间,海外高科技人才对区域经济增长的影响效应有所减弱。该研究可以为各地区海归回流与人才引进政策的制定与完善提供科学依据和参考,进而更好地服务于我国区域经济发展,使其以稳健的发展步伐前进。

Abstract:

Using the provincial panel data of China from 2002 to 2016, this paper based on the background of international talent migration and returnees reflux of Chinese, and taken R D investment intensity as the threshold variable of human resources to the growth of China"s regional economy to construct the threshold regression model, empirically studies the reflux of overseas high-tech talents to the development of China"s regional economy. The research result shows that the double threshold effect of R D investment plays a significant role in the contribution of overseas high-tech talents to regional economic development. With the different intensity of R D investment, there is a u-shaped relationship between the positive influence of overseas high-tech talents and regional economic growth. Specifically, when the R D intensity is less than 0.010 or greater than 0.058, its positive impact is most significant. However, between the value, the effect will be weakened. The research provides scientific basis and references for the formulation and improvement of returnees in all regions and the introduction of talent strategy, and to better serves our country’s regional economy development in our country, make it to the steady pace of development.